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Books : Science : Physics : Solid-State Physics : Thin Films
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Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description of the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.
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This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field.
Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.
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Twice reprinted and now also available in a paperback edition, this book has already proved invaluable to a wide range of readers. Written by a scientist for scientists and technical people, it goes beyond the subject matter indicated by the title, filling the gap which previously existed in the available technical literature. It includes a wealth of information for physicists, chemists and engineers who need to know more about thin films for research purposes, or who want to use this special form of solid material to achieve a variety of application-oriented goals.
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Thin Film Magnetoresistive Sensors presents a comprehensive review of thin film magnetoresistive (MR) sensors, including the theory of MR effects as well as the design, fabrication, properties, and applications of MR sensors. With over 1,000 references, the book fully reviews the theory, development, and use of these sensors. It provides essential information about the performance of various kinds of sensors, including permalloy magnetoresistors, spin valve sensors, multilayer sensors, colossal effect sensors, spin dependent tunneling sensors, and magnetoimpedance sensors.
Divided into three independent parts, the book first concentrates on the most widely used sensors-anisotropic magnetoresistive sensors (AMR). The second part deals with giant magnetoresistive (GMR) sensors, including those still in development. In the third section, the book describes the applications of MR sensors, especially in data storage systems, industrial measurements, and nondestructive material testing systems.
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During the past two decades, revolutionary breakthroughs have occurred in the understanding of ferroelectric materials, both from the perspective of theory and experiment. First principles approaches, including the Berry phase formulation of ferroelectricity, now allow accurate, quantitative predictions of material properties, and single crystalline thin films are now available for fundamental studies of these materials. In addition, the need for high dielectric constant insulators and nonvolatile memories in semiconductor applications has motivated a renaissance in the investigation of these materials. This book addresses the paradigmatic shifts in understanding brought about by these breakthroughs, including the consideration of novel fabrication methods of single crystalline ferroelectric thin films and nanoscale applications of these materials, and new theoretical methods such as the effective Hamiltonian approach and density functional theory. A book for practicing scientists as well as graduate students.
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Very common optical coatings are those that give the faint, reflected color to the lenses in cameras, binoculars, and spectacles. The thin metal layer that makes the difference between a mirror and a simple sheet of glass is an optical coating. But, optical coatings are used in many more applications-a particularly important current one being the splitting and combining of optical channels of communication that are directed through a common optical fiber. Most modern optical systems could not function without optical coatings. The telecommunications industry uses various types of coatings, such as antireflection coatings, polarizers, and dichroic coatings, in personal displays, computer monitors, and projection TV systems. Optical coatings are an integral part of semiconductor laser systems, CD and DVD optical systems, and fiber-optic networks.
First published in 1969, Thin Film Optical Filters still serves as the major reference and textbook in the field. This third edition provides a unified treatment of the design, manufacture, performance, and application of optical thin films. It includes the mathematics necessary for readers to carry out thin-film calculations and contains extensive reference to the original literature. The coverage of optical filters includes antireflection and high-reflectance coatings. This is a comprehensive introduction to thin-film optical filters writ
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Langmuir-Blodgett films are the focus of intense current worldwide interest, as the ability to deposit organic films of nanometer thicknesses has many implications in materials science and in the development of new electronic and opto-electronic devices. This book provides a multidisciplinary introduction to the subject of Langmuir-Blodgett films. Beginning with the application of simple thermodynamics to the common bulk phases of matter, the book outlines the nature of the phases associated with floating monolayer films. The Langmuir-Blodgett deposition process itself is described in some detail and contrasted with other thin film techniques. The author separately discusses monolayer-forming materials and the structural, electrical and optical properties of Langmuir-Blodgett films. Each chapter is comprehensive, easy to understand and generously illustrated. Petty provides appendices for the reader wishing to delve deeper into the physics and chemistry background. Graduates and postgraduates in materials science will find this text of great interest.
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Designed for experimentalists, who study the dynamics of thin film growth using diffraction techniques, and for theorists, who wish to learn such a dynamic behaviour in Fourier space, this book aims to bring the reader to the forefront of research in the area of the dynamics of interface growth.
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The development of oriented organic monomolecular layers by the Langmuir-Blodgett (LB) and self-assembly (SA) techniques has led researchers toward their goal of assembling individual molecules into highly ordered architectures. Thus the continually growing contribution of LB and SA systems to the chemistry and physics of thin organic films is widely recognized. Equally well-known is the difficulty in keeping up to date with the burgeoning multidisciplinary research in this area. Dr. Ulman provides a massive survey of the available literature. The book begins with a section on analytical tools to broaden the understanding of the structure and properties of monolayers and films. Following sections discuss LB films, the preparation and properties of SA monolayers and films, the modeling of LB and SA monolayers, and the application of LB and SA films.
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This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.
For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.
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Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.
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This new volume of the highly respected Physics of Thin Films Serial discusses inhomogeneity in real films and surfaces. The volume, guest-edited by K. Vedam, follows the growth of thin films both from the surface of the substrate, and from the atomic level, layer by layer. The text features coverage of Real-Time Spectroscopic Ellipsometry (RTSE) and Reflectance Anisotropy (RA), two major breakthrough optical techniques used to characterize real time and insitu films and surfaces. In six insightful chapters, the contributors assess the impact of these techniques, their strengths and limitations, and their potential for further development.
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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects.
Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new title
reflects more accurately the rapidly growing inclusion of research and
development efforts on nanostructures, especially in relation to novel
solid-state device formats
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This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control.
Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field.
Key Features
* The
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This book emphasises both experimental and theoretical aspects of surface, interface and thin film physics. Compa- red to the earlier editions, which bore the title "Surfaces and Interfaces of Solid Materials", the book now places more emphasis on thin films, including also their superconducting and ferromagnetic properties. The present 4th edition thus presents techniques of preparing well-defined solid surfaces and interfaces, fundamental aspects of adsorption and layer growth, as well as basic models for the descripti- on of structural, vibronic and electronic properties of sur- faces, interfaces and thin films. Because of their importan- ce for modern information technology, significant attention is paid to the electronic properties of semiconductor inter- faces and heterostructures. Collective phenomena , such as superconductivity and ferromagnetism, also feature promi- nently. Experimental sections covering essential measurement and preparation techniques are presented in separate panels.